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Center Layout & Apparatus

The total surface area of CPTFT is 1,389 m2. CPTFT contains 15 individual experimental sections, including Advanced physical Vapor Deposition Lab Ⅰ, Advanced Chemical Vapor Deposition Lab, Advanced physical Vapor Deposition Lab Ⅱ, Thin Films & Mechanical Properties Testing Lab, Advanced Plasma Lab, Optoelectronic Measurement Lab, Industry-Processing Lab, Industry-testing Equipment Lab, Applied Biological Thin Films Lab, Liquid Plasma Lab, Plasma Surface Engineering Lab, Functional Atmospheric Plasma Lab, Plasma & Vacuum Technology Training Lab, Corrosion Prevention & Control Lab, Thin Film And Material Simulation Lab, as well as an office room and a multi-functional meeting room.

 

 Advanced Chemical Vapor Deposition Lab.

Inductively Coupled Plasma-Chemical Vapor Deposition, ICP-CVD 

 

 Advanced Physical Vapor Deposition Lab.Ⅰ

 In- Line Physical Vapor Deposition

 Batch Type Physical Vapor Deposition

 

 Advanced Physical Vapor Deposition Lab.Ⅱ

High Power Impulse Magnetron Sputtering, HIPIMS

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Thin Films & Mechanical Properties Testing Lab.

Scratch Tester

刮痕儀

Tribometer

磨耗儀

Thin Film Impact Tester

 

Advanced Plasma Lab.

Plasma Polymerization System

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Optoeletronic Measurement Lab.

Photoelectrochemical Measuring System

UV-Visible Spectrophotometer)

 

Industry Process Lab.

 Ion-Beam Assisted Deposition, IBAD

 Reactive Ion Etcher, RIE

Deposition System

33

 Organic-inorganic hybrid coating system

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Industry-Testing Equipment Lab.

3D print

00

Electro-spinning

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Solution Plasma Lab.

Solution Plasma System

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Applied Biological Thin Films Lab.

Laminar Flow

00

Microscope

00

 

Plasma Surface Engineering Lab.

00

 

Functional Atmospheric Plasma Lab.

Bio-Plasma System

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機械手臂

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