Center Layout & Apparatus
The total surface area of CPTFT is 1,389 m2. CPTFT contains 15 individual experimental sections, including Advanced physical Vapor Deposition Lab Ⅰ, Advanced Chemical Vapor Deposition Lab, Advanced physical Vapor Deposition Lab Ⅱ, Thin Films & Mechanical Properties Testing Lab, Advanced Plasma Lab, Optoelectronic Measurement Lab, Industry-Processing Lab, Industry-testing Equipment Lab, Applied Biological Thin Films Lab, Liquid Plasma Lab, Plasma Surface Engineering Lab, Functional Atmospheric Plasma Lab, Plasma & Vacuum Technology Training Lab, Corrosion Prevention & Control Lab, Thin Film And Material Simulation Lab, as well as an office room and a multi-functional meeting room.
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Advanced Chemical Vapor Deposition Lab. |
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Inductively Coupled Plasma-Chemical Vapor Deposition, ICP-CVD
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Advanced Physical Vapor Deposition Lab.Ⅰ |
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In- Line Physical Vapor Deposition
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Batch Type Physical Vapor Deposition
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Advanced Physical Vapor Deposition Lab.Ⅱ |
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High Power Impulse Magnetron Sputtering, HIPIMS
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Thin Films & Mechanical Properties Testing Lab. |
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Scratch Tester
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Tribometer
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Thin Film Impact Tester
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Advanced Plasma Lab. |
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Plasma Polymerization System
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Optoeletronic Measurement Lab. |
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Photoelectrochemical Measuring System
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UV-Visible Spectrophotometer)
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Atmospheric Plasma Treatment System
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Industry Process Lab. |
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Ion-Beam Assisted Deposition, IBAD
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Reactive Ion Etcher, RIE
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Deposition System
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Organic-inorganic hybrid coating system
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Industry-Testing Equipment Lab. |
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3D print
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Electro-spinning
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Solution Plasma Lab. |
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Solution Plasma System
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Applied Biological Thin Films Lab. |
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Laminar Flow
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Microscope
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Plasma Surface Engineering Lab. |
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Functional Atmospheric Plasma Lab. |
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Bio-Plasma System
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機械手臂
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